ICMEM2017 Keynote Speakers
Prof. Xiaohong Zhu (朱小红教授)
Sichuan University, China (四川大学)
Biography: Dr. Xiaohong Zhu is currently a full professor at Department of Materials Science, Sichuan University, China. Dr. Zhu received his BSc degree in Materials Physics from Sichuan University in 2000 and PhD degree in Condensed Matter Physics from the Institute of Physics, Chinese Academy of Sciences in 2006. After that, he did 3-year postdoctoral research at CNRS and CEA in France, and then joined Sichuan University as a professor in 2009. From April 2012 to April 2013, he was also a research scholar at the Department of Physics & Department of Materials Science and Engineering, University of California, Berkeley, USA. He was selected as a New Century Excellent Talent in University of China in 2009 and an Outstanding Young Scientific and Technological Leader of Sichuan Province, China in 2011. Dr. Zhu’s research interests include mainly graphene-based electrode materials and novel solid-state electrolytes for energy storage devices (supercapacitors and lithium-ion batteries), piezoelectric ceramics, as well as multifunctional oxide thin films and related electronic devices. Until now, he has authored/co-authored more than 80 SCI-indexed papers and 2 scientific books.
Title of Speech: High-k Dielectric and Ferroelectric Thin Films for Capacitive Applications
Abstract: Capacitors are key passive components in most integrated circuits which are often used in analog filtering, analog-to-digital conversion, signal coupling, dc decoupling, and data storage. The miniaturization of capacitors with high capacitance values requires the use of dielectrics possessing a high capacitance density per unit area, namely, high-k dielectrics. Accordingly, the replacement of traditional dielectrics (εr<10), SiO2 and Si3N4, by oxide materials with higher permittivity is an inevitable trend of development. Oxide high-k dielectric and ferroelectric thin films therefore have great potentials for capacitive applications. In many cases, a high dielectric permittivity, a small quadratic voltage coefficient of capacitance, and a good thermal stability are required, while in some other cases, a high dielectric tunability (voltage-sensitive permittivity), a low dielectric loss, and an appropriate level of dielectric permittivity are basic requirements, e.g. for electrically tunable microwave device applications. Nonetheless, the dielectric properties of thin films are substantially inferior to those of their bulk counterparts, and heavily depend upon the deposition process, base electrodes, microstructure, film thickness, oxygen content, and film homogeneity, etc. Therefore, a great deal of effort is underway to improve the film quality and to push oxide high-k dielectric and ferroelectric films further for practical applications. In addition, a low temperature process can ensure the applicability of high-k and ferroelectric thin films in above-IC technologies and at the same time benefit from a low thermal budget. In this talk, I will present our research breakthroughs in studying the growth mechanism, dielectric properties, and potential applications of several important high-k and ferroelectric thin films, such as (Ba,Sr)TiO3 (BST), Ba(Zr,Ti)O3 (BZT), BiFeO3 (BFO-I), Bi24Fe2O39 (BFO-II), perovskite-structured Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMNT-I), and pyrochlore-structured PbO-MgO-Nb2O5-TiO2 (PMNT-II).
Prof. Sofian M. Kanan
American University of Sharjah (AUS), U.A.E
Biography: Sofian Kanan received his B.Sc. and M.Sc. degrees from Yarmouk University in 1989 and 1991, respectively. He earned his Ph.D. in Inorganic & Material Chemistry from the University of Maine in 2000 and he worked as a Research Associate at the Laboratory for Surface Science & Technology (LASST), University of Maine for two years. He also worked as a Senior Scientist at Sensor Research and Development Corporation (SRD-Corp.) for one year. In 2003, he started his academic career as an Assistant Professor at the American University of Sharjah (AUS) where he was promoted early to the rank of Professor of Chemistry in 2012. Prof. Kanan has received a number of awards and grants for his teaching and research activities. He is an Editorial Board Member of Scientific Reports and Research on Chemical Intermediates Journals. His research interests fall under the general umbrella of developing material properties through the use of surface chemistry. Specifically, Dr. Kanan’s work is centered on the development and use of different spectroscopic techniques to probe reactions at the solid/liquid and solid/gas interface. The primary goal of his research is to obtain an understanding of the relationship between the molecular surface chemistry and macroscopic properties of materials.
Title of Speech: Modified Zeolites to Decontaminate Water Resources from Organic Pollutants
Abstract: A new route to fabricate silver and gold-based material incorporated into the Y zeolite framework is reported. X-ray fluorescence (XRF), X-ray photoelectron spectroscopy (XPS), UV-Visible diffuse reflectance, and low-temperature steady-state photoluminescence spectroscopic results indicate the formation of metallic silver and gold as well as ionic clusters in the zeolite framework. Microwave treatment affects the surface morphology and the metal content of the modified materials. The prepared materials showed strong catalytic activity for the photodegradation of various pesticides. For example, the photodecomposition of the pesticide naptalam is enhanced in the presence of silver and gold doped into zeolite Y catalysts. The largest catalytic activity is observed for microwave treated mixed Ag-Au (Ag-AuYm) catalyst where the rate constant is 2.0 x 10-3 s-1 compared to the rate constant of 1.0 x 10-4 s-1 for the uncatalyzed irradiated naptalam solution. While, the microwave treated mixed sample (Ag-AuYm) acts as a good catalyst for the degradation of naptalam, the untreated sample (Ag-AuY) provides a selective surface that completely adsorbs naptalam from solution.
In addition, the presence of silver clusters doped into mordenite was found to enhance the photodecomposition rate of phosmet by 30+ fold was observed upon the irradiation with 302 nm compared to the uncatalyzed reaction. The photocatalytic products were identified using HPLC and GC-MS techniques.